|
ICP-AES 2000 Inductively Coupled Plasma Spectrometers can detect approximately 70 trace to constant elements in different materials. They are widely used in scientific research Institutes, colleges, and other industry enterprises related to the fields such as geology, metallurgy, rare earth materials, electro-plating, cement, petroleum, chemical engineering, environmental detection, non-ferrous metals, medical science, food and agriculture.
Applications
Petrochemical engineering Minerals Metallurgy Geography Medicine safety Lab research Environment monitoring Food safety
Performance characteristics
Simultaneous measurement of multi elements Low detection limit: 0.1-10ppb, and even lower Wide density linear range, 5-6 orders of magnitude Less chemical interference, maximum accuracy, RSD≤2% High analysis speed,low cost
| Specifications |
|
RF Generator Specifications
|
|
Circuit type
|
Inductively feedback self-oscillation circuit, coaxial cable transmission, matched tuning, power feedback close-loop auto-control
|
|
Working frequency
|
40MHz±0.05%
|
|
Frequency stability
|
<0.1%
|
|
Power output
|
800W-1200W
|
|
Power output stability
|
<0.3%
|
|
Intensity of electromagnetic leakage
|
Electric filed intensity in 30cm distance to the body: E:<2V/m
|
|
High Frequency Box
|
High Frequency Box excites very stable plasma torch by exploiting the inductively feedback self-oscillation circuit. The circuit is transmitted by coaxial cable, matchingly tuned and implements close-loop auto-control by means of power feedback (National Patented Invention). Industrial argon can be used in this kind of generator, which not only makes the lighting the ICP torch easy but also saves the cost of highly purified argon.
|
|
Match box
|
The high performance match box is composed of vacuum ceramic adjustable capacitors and gas adjustable capacitors, which allows it to reach the best match state and achieve maximum effective output on load coils.
|
|
Directional coupler
|
The stability of power output is achieved by controlling the anode voltage of oscillation valve after the power signals are sent out of the directional coupler and get amplified by the amplifier.
|
|
Sample introduction system specifications
|
|
Inner diameter of output coils
|
25 mm, 3 coils
|
|
Torch
|
Three concentric torches, outer diameter 20 mm, quartz
|
|
Nebulizer
|
Meinhard glass concentric
|
|
Outer diameter of coaxial nebulizer
|
6 mm
|
|
Spray chamber
|
Scott double-pass spray chamber
|
|
Outer diameter of spray chamber
|
34 mm
|
|
Specifications of Ar flowmeter and carrier gas pressure gauge
|
|
Plasma gas flowmeter
|
(100-1000)L/h (1.6-16L/min)
|
|
Auxiliary gas flowmeter
|
(10-100)L/h (0.16-1.66L/min)
|
|
Carrier gas flowmeter
|
(10-100)L/h (0.16-1.66L/min)
|
|
Carrier gas pressure stabilization valve
|
0-0.4MPa
|
|
Cooling water:
|
Water temperature: 15-25℃ Flow rate >5L/min Water pressure: >0.1MPa Resistivity>1MΩ
|
|
Technical Specifications of Optical System
|
|
Optical path
|
Czerny-Turner
|
|
Focal length
|
1000 mm
|
|
Grating specification
|
Ion Beam Etching Holographic Grating; Etching density - 3600 grooves/mm;(alternative - 2400 grooves/mm) Etching area - 80×110 mm
|
|
Reciprocal linear dispersion rate
|
0.26 nm
|
|
Resolution
|
3600 grooves/mm - ≤ 0.008 nm at Mn 257.61 nm (option 2400 grooves/mm - ≤ 0.016 nm at Mn 257.61 nm)
|
|
Scan wavelength range
|
3600 grooves/mm scan wavelength range: 195-500 nm (option 2400 grooves/mm scan wavelength range: 195-800 nm)
|
|
Minimum pace of stepper motor drive
|
0.0006 nm
|
|
Exit and entrance slit
|
20 μm
|
|
Speculum specifications
|
78×105×16 mm
|
|
Lens
|
φ30,1:1 imaging
|
|
Thermostatic device for optical system
|
32°C±1°C
|
|
|
|

|
This specification can be changed without prior notice.
|
|